Defect observation method and device therefor

摘要

The present invention is detection of a defect signal which is small enough to be buried in a background noise, by a method that includes detecting a defect on a specimen which is detected by another inspection device by using a detection device equipped with an optical microscope, amending positional information of the defect, observing the defect by using an SEM, wherein the detecting the defect is carried out such that forming stationary waves on the specimen by irradiating the specimen with two illumination lights having the same wavelength from the opposite directions on the same incidence plane at the same incidence angle and cause the two illuminating light to interfere; removing scattered components generated by minute irregularities on the specimen surface by a spatial filter, detecting an image formed by the scattered light not removed by the spatial filter; and processing the detected image to detect the defect.

主权项

1. A defect observation method, comprising the steps of:
detecting defects on a specimen detected by an inspection device using a detection device having an optical microscope on the basis of positional information of the defects; amending positional information of the defects on the specimen detected by the inspection device on the basis of positional information of the defects detected by the detection device having the optical microscope; and observing the defects detected by the inspection device by using an SEM (Scanning Electron Microscope) on the basis of the amended positional information, wherein the defects on the specimen detected by the inspection device are detected by the detection device having the optical microscope by:
forming stationary waves on the specimen by allowing two illumination lights having a same wavelength to enter a same incidence plane of the specimen at a same incidence angle from directions that are opposite to each other and interfering with each other;removing scattered light components generated from minute irregularities on a surface of the specimen among scattered light from the specimen on which the stationary waves are formed by a spatial filter;detecting an image of scattered light from the specimen that are not removed by the spatial filter; andprocessing the detected image of the scattered light to detect the defects on the specimen detected by the inspection device.