Halterungsvorrichtung aus Graphit zur Erzeugung isothermer Temperaturverteilungen auf mittels Hochfrequenzenergie erhitzten,epitaktischen Prozessen zu unterwerfenden Halbleiterplaettchen

摘要

1287797 Minature furnace carriers INTERNATIONAL BUSINESS MACHINES CORP 5 Nov 1969 [8 Nov 1968] 54162/69 Heading F4B [Also in Division H1] A carrier of suscepter material, e.g. graphite, supporting a substrate 25 during heat treatment in a reaction chamber 10 comprises a boat 20 formed with circular pockets 30 each having a peripheral shoulder 34 supporting said substrate and spaced from the floor 36 by a distance “T where T is the thickness of a semi-conductor wafer before treatment, Additional support for the wafer may be provided by a central core (38, Fig. 6). The reaction chamber comprises a quartz tube 12 surrounded by a high frequency heating coil 14 and having a conduit 18 introducing reactants fron gaseous sources 20a, 20b, and 20c. Heat is induced in both the boat and the substrate and radiation and conduction from the former equalizes the heating effect on the substrate.