The DRAM cell has the feature that an oxide layer(9) formed by oxidizing a plate electrode(6) on a drain region(10') is close to a bit line(8) connected to the drain region(10'). The DRAM cell reduces the distance between the storage electrodes by forming the above oxide film(9). The method enables to form the DRAM cell with a few process.
申请公布号
KR960011653(B1)
申请公布日期
1996.08.24
申请号
KR19930006462
申请日期
1993.04.16
申请人
HYUNDAI ELECTRONICS IND. CO., LTD.
发明人
PARK, CHAN - KWANG;KO, YO - HWAN;HWANG, SUNG - MIN;NOH, KWANG - MYUNG