发明名称 DRAM CELL AND THE METHOD
摘要 The DRAM cell has the feature that an oxide layer(9) formed by oxidizing a plate electrode(6) on a drain region(10') is close to a bit line(8) connected to the drain region(10'). The DRAM cell reduces the distance between the storage electrodes by forming the above oxide film(9). The method enables to form the DRAM cell with a few process.
申请公布号 KR960011653(B1) 申请公布日期 1996.08.24
申请号 KR19930006462 申请日期 1993.04.16
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 PARK, CHAN - KWANG;KO, YO - HWAN;HWANG, SUNG - MIN;NOH, KWANG - MYUNG
分类号 H01L23/522;H01L21/768;H01L21/8242;H01L27/10;H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L23/522
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