| 摘要 |
PURPOSE:To obtain a stable alignment mark with clear contrast by providing a plurality of thin films for forming the alignment marks and providing the alignment mark as a line by closely placing the edges of thin films each other. CONSTITUTION:A film 72 to be etched for giving the alignment mark is formed on a lower base layer 71. A resist film 73 is formed on this film 72 and a window 74 is formed to the resist film 73 by selective patterning. The film 72 is then etched in such a depth as reaching the lower base layer 71 through the window 74. The V-shaped groove 75 is formed to this layer 71. At this time, width through which the surface of layer 71 is exposed is considerably shorer than thickness of film 72. Thereafter, the film 73 is removed. Thereby, amplitude of edge profile changes only at the one area 6 and therefore the alignment mark is recognized as a single line. |
