发明名称 GOLD PLATING BATH AND PLATING METHOD
摘要 PURPOSE:To prevent the deposition of gold on a substrate resulting from protrusion from fine copper circuits, etc., by carrying out undercoat plating by using, e.g. a bath containing water-soluble gold compound at the time of applying the prescribed gold plating to a copper material using a plastic film as a substrate. CONSTITUTION:Gold striking is applied to a copper material using a plastic film (e.g. of polyimide or polyamide) as a substrate by using a water-soluble gold plating bath. A gold plating bath which contains a water-soluble gold sulfite compound free of alkali metal ions and a water-soluble sulfite and further contains a compound selected from water-soluble polyamine, water-soluble polyamino carboxylic acid, etc., and a compound selected from quinoline, hydroxyquinoline, etc., is prepared. Gold palting is applied to the above- mentioned undercoat-plated copper material by using the above gold plating bath.
申请公布号 JPH03173791(A) 申请公布日期 1991.07.29
申请号 JP19890312267 申请日期 1989.12.02
申请人 N E CHEMCAT CORP 发明人 KUDO TOMIO;YOSHIZAWA MITSUAKI
分类号 C25D3/48;C25D5/12;C25D5/24;H01L23/48;H05K3/18 主分类号 C25D3/48
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