APPARATUS AND METHOD FOR FORMING DEPOSITED FILM

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for forming a deposited film in which a photovoltaic element having no any characteristic irregularities can be obtained by depositing a semiconductor layer free from any un uniformity in film thickness and film quality. SOLUTION: In the deposited film forming method for continuously forming the deposited film on a substrate 104 by generating plasma in a plurality of continuous vacuum containers while continuously shifting the strip-like substrate 104 in the longitudinal direction thereof, the shape of an aperture in a discharging container is adjusted by an aperture adjusting plate 102 whose shape is set so that irregularities in the thickness of the deposited film in the width direction of the substrate are reduced based on the measurement of the distribution of the deposition speed.