| 发明名称 |
Polymer suitable for photoresist compositions |
| 摘要 |
The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
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| 申请公布号 |
US6486282(B1) |
申请公布日期 |
2002.11.26 |
| 申请号 |
US20010854312D |
申请日期 |
2001.05.11 |
| 申请人 |
CLARIANT FINANCE (BVI) LIMITED |
发明人 |
DAMMEL RALPH R.;SAKAMURI RAJ |
| 分类号 |
C08F220/42;C08F6/12;C08F222/32;C08F232/08;G03F7/004;G03F7/038;G03F7/039;(IPC1-7):C08F120/42 |
主分类号 |
C08F220/42 |
| 代理机构 |
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| 地址 |
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