POLISHING COMPOSITION FOR MAGNETIC DISKS COMPRISING A SURFACE CLEANING AGENT AND POLISHING METHOD

摘要

A polishing composition for polishing a magnetic disk substrate, characterized by comprising water, abrasive grains, a polishing accelerator, and a surface cleaning agent which is a compound comprising a main chain of 2 to 6 carbon atoms and optionally an oxygen atom, said compound having a plurality of hydroxyl groups. The composition is capable of providing a magnetic disk substrate having low surface roughness, generating no protrusion or scratch, preventing deposition of residues on the substrate surface, realizing high-density recording, and being capable of polishing the substrate at a cost-effective rate.