发明名称 TRANSFER ROBOT FOR SEMICONDUCTOR WAFER, AND TREATMENT APPARATUS EQUIPPED WITH IT
摘要 PROBLEM TO BE SOLVED: To solve the problem that because when a belt etc. used in a conventional transfer robot are set in a high temperature and a high vacuum environment, organic substances are evaporated and released to the outside to degrade the product yield of semiconductor devices, if several magnetic seals are stacked and provided on a movable part to prevent this, the size and the weight of the transfer robot increase, and if a belt mechanism is used, the three dimensional shape of an arm must be of a long slender box. SOLUTION: In the transfer robot, the rotation pivot of a drive means for a body of the robot and an end effector are connected with a wire in place of a conventional belt mechanism, and the end effector is turned interlocked by the turning of the wire about the central axis thereof. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005236218(A) 申请公布日期 2005.09.02
申请号 JP20040046692 申请日期 2004.02.23
申请人 RORZE CORP 发明人 SATO YUKIHISA
分类号 B25J9/06;B25J17/00;B25J19/00;B65G49/07;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B25J9/06
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