发明名称 Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern
摘要 The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on the magnetic film, the layer is less prone to tailing and undercutting phenomena.
申请公布号 US2007099107(A1) 申请公布日期 2007.05.03
申请号 US20040561760 申请日期 2004.07.06
申请人 SHIMBORI HIRISHI 发明人 SHIMBORI HIRISHI
分类号 G03C1/00;G03F7/039 主分类号 G03C1/00
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