SYSTEM AND METHOD FOR POLISHING SURFACE OF TAPE-LIKE METAL BASE MATERIAL

摘要

Provided are a system and a method for uniformly polishing a surface of a tape-like metal base material in a unit of several hundred meters, at a high speed and a high efficiency. The polishing system for continuously polishing the surface of the tape-like metal base material to be polished is provided with an apparatus for continuously running the tape-like metal base material; an apparatus for applying a prescribed tension to the tape-like metal base material; a first polishing apparatus for performing initial polishing at random to the surface of the tape-like metal base material to be polished; and a second polishing apparatus for performing final polishing to the surface of the tape-like metal base material to be polished, along the running direction. A polishing mark is formed by the final polishing, along the running direction on the surface to be polished.