发明名称 |
Alignment correction method for substrate to be exposed, and exposure apparatus |
摘要 |
An alignment correction method includes: the step of detecting coordinates of a first observation point 14 and a second observation point 15 set in advance on a substrate to be exposed 1 that is being scanned in a scanning direction A, in order to observe an alignment deviation of the substrate to be exposed 1; the step of computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point 14 and the second observation point 15; and the step of correcting alignment of a subsequent substrate to be exposed 1 based on the computed correction amount. |
申请公布号 |
US9360776(B2) |
申请公布日期 |
2016.06.07 |
申请号 |
US201414168212 |
申请日期 |
2014.01.30 |
申请人 |
V TECHNOLOGY CO., LTD. |
发明人 |
Nomura Yoshiaki;Arai Toshinari |
分类号 |
G01B11/00;G03B27/32;G03B27/74;G03F9/00;H01L21/68;G03F7/20 |
主分类号 |
G01B11/00 |
代理机构 |
McDermott, Will & Emery LLP |
代理人 |
McDermott, Will & Emery LLP |
主权项 |
1. An alignment correction method for a substrate to be exposed, which corrects alignment of a subsequent substrate to be exposed based on an alignment deviation of a previously exposed substrate to be exposed, in a process of exposing successively substrates to be exposed that are being scanned in a scanning direction by a scanning device,
the method comprising the steps of: detecting coordinates of a first observation point and a second observation point set in advance on a substrate to be exposed that is being scanned in the scanning direction, so as to observe an alignment deviation of the substrate to be exposed; computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point and the second observation point; and correcting alignment of a subsequent substrate to be exposed based on the computed correction amount. |
地址 |
Yokohama-shi JP |