| 发明名称 |
MONITORING SYSTEM FOR DEPOSITION AND METHOD OF OPERATION THEREOF |
| 摘要 |
A monitoring and deposition control system and method of operation thereof including: a deposition chamber for depositing a material layer on a substrate; a sensor array for monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and a processing unit for adjusting deposition parameters based on the changes in the layer thickness during deposition. |
| 申请公布号 |
US2016181134(A1) |
申请公布日期 |
2016.06.23 |
| 申请号 |
US201514839656 |
申请日期 |
2015.08.28 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Budiarto Edward W.;Foad Majeed A.;Hofmann Ralf;Nowak Thomas;Egan Todd;Vaez-Iravani Mehdi |
| 分类号 |
H01L21/67;H01L21/02;H01L21/285;H01L21/66;H01L21/033 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of operation for a monitoring and deposition control system comprising:
depositing a material layer on a substrate; monitoring deposition of the material layer for changes in a layer thickness of the material layer during deposition; and adjusting deposition parameters based on the changes in the layer thickness of the material layer during deposition. |
| 地址 |
Santa Clara CA US |
