POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME

摘要

A POLISHING PAD OF EXCELLENT DURABILITY AND ADHESION BETWEEN THE POLISHING LAYER AND THE BASE MATERIAL LAYER INCLUDES A POLISHING LAYER ARRANGED ON A BASE MATERIAL LAYER, WHEREIN THE POLISHING LAYER INCLUDES A THERMOSETTING POLYURETHANE FOAM HAVING ROUGHLY SPHERICAL INTERCONNECTED CELLS HAVING AN AVERAGE CELL DIAMETER OF 20 TO 300 µM. THE POLYURETHANE FOAM INCLUDES AN ISOCYANATE COMPONENT AND AN ACTIVE HYDROGEN-CONTAINING COMPOUND AS STARTING MATERIAL COMPONENTS, AND THE ACTIVE HYDROGEN-CONTAINING COMPOUND INCLUDES 30 TO 85% BY WEIGHT OF A HIGH-MOLECULAR-WEIGHT POLYOL HAVING 2 TO 4 FUNCTIONAL GROUPS AND A HYDROXYL VALUE OF 20 TO 100 MG KOH/G.