SEMICONDUCTOR DEVICES AND METHOD FOR FORMING THE SAME

摘要

A manufacturing method of a semiconductor device comprises the following steps of: forming mask patterns on a substrate; forming a sub-film, which covers the mask patterns, on the substrate; anisotropically etching the sub-film to form sub-patterns on sidewalls of the mask patterns; and etching the mask patterns and the sub-patterns of the substrate by an etching mask to form a trench, which defines active patterns. Therefore, the method can easily manufacture a semiconductor device having excellent reliability.