| 摘要 |
A cadmium mercury telluride (C.M.T.) layer (5) is epitaxially grown on a substrate (1, 2) of, for example, cadmium telluride. The substrate (3) is subsequently etched away with a mixture of nitric, hydrofluoric and lactic acids. A thin barrier layer (3) of mercury telluride is provided which is not attacked by the above etching solution. This barrier layer is removed by polishing to leave an optically flat C.M.T. layer which may incorporate a cadmium telluride passivating layer on its surface. <IMAGE> |
