| 摘要 |
PURPOSE:To obtain a printing plate causing no printing stain and having superior printing resistance by subjecting a photosensitive material using a photosensitive composition contg. resol type phenol resin having a specified percentage or more of dibenzilic ether bonds to exposure, development and curing by heating to a specified temp. or above. CONSTITUTION:Phenols represented by the formula [where each of R1, R2 and R3 is H, halogen, OH, NO2 1-20C alkyl, alkoxy, acyl or (substituted) phenyl] are reacted with aldehyde such as H2CO or ketone to obtain resol type phenol resin having -CH2OCH2- bonded to each phenol ring by >=15mol% of the total amount of -CH2OCH2-, -CH2- and -CH2OH. A soln. of a photosensitive composition contg. diazo resin as well as the resol type phenol resin is applied to an Al plate and dried to produce a photosensitive material. This material is exposed, developed with an alkaline aqueous developer, and heated to >=140 deg.C. Thus, a printing plate causing no printing stain and having high printing resistance is obtd. by using the photosensitive material having superior developability and aging stability and curable at such a low temp. |
