发明名称 PROCESS FOR DEPOSITING METALLIC COPPER
摘要 <p>PHOTOCHEMICAL CONVERSION OF SiO TO SiO2 SiO can be photochemically converted to SiO2 by irradiation with ultraviolet light of wavelengths less than 220 nm in an atomosphere including oxygen. The irradiation can be pulsed or continuous radiation, and energy fluences of at least about 5 mJ/cm2 will effect the photochemical reaction. The conversion of SiO to SiO2 can be used to provide an etch-stop in a fabrication process and to provide improved devices and circuits, in technologies such as Josephson and semiconductor device technologies.</p>
申请公布号 CA1225363(A) 申请公布日期 1987.08.11
申请号 CA19840460823 申请日期 1984.08.10
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BAUM, THOMAS H.;HOULE, FRANCES A.;JONES, CAROL R.
分类号 H05K3/14;C23C16/18;H01L21/28;H01L21/285;(IPC1-7):C23C16/48 主分类号 H05K3/14
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