发明名称 BASE PRECURSOR
摘要 PURPOSE:To obtain a base precursor, consisting of a specific compound, capable of readily and rapidly releasing a base by heating, useful as a heat developing type recording material and having high hydrophobicity and preservation stability. CONSTITUTION:A base precursor consisting of a compound expressed by formula I [R<1> is H, (substituted)alkyl, (substituted)cycloalkyl, (substituted)alkenyl, etc.; X is O or S; B is a monovalent group corresponding to an atomic group obtained by removing H linked to the N atom from an organic base, e.g. primary, secondary amine, etc.]. The above-mentioned precursor is capable of preventing contact with constituent components of a recording material caused by dissolution of the base precursor in a coating solution in producing the recording material since hydrophobicity is enhanced. An organic base converted into (B) in formula I is particularly has a compound expressed by formula II [at least one of R<21>-R<23> is H, (substituted)alkyl, (substituted)cycloalkyl, etc.; R<24> is H, (substituted)amino, etc.].
申请公布号 JPS6396159(A) 申请公布日期 1988.04.27
申请号 JP19860242798 申请日期 1986.10.13
申请人 FUJI PHOTO FILM CO LTD 发明人 TSUKAHARA JIRO;KAKIMI FUJIO;NAKAMURA TAKU
分类号 C07D295/20;C07C67/00;C07C233/04;C07C233/05;C07C233/07;C07C239/00;C07C279/16;C07C325/00;C07C335/04;C07D211/72;C07D233/61;C07D239/06;C07D239/10;G03C1/06;G03C1/498;G03C1/60;G03C1/61 主分类号 C07D295/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利