| 摘要 |
PURPOSE:To pass only a high cleanness section and to reduce a clean room by disposing a first transfer apparatus between steps, between stockers in a step, and a second transfer apparatus between the stocked in the step, between manufacturing devices. CONSTITUTION:A first transfer apparatus 3 uses a magnetic fluid levitation transfer apparatus, a transfer passage 3a is disposed in a traveling direction on a trestle 3c, and moved horizontally. In a second transfer apparatus 4, an arm 12 having a holder 11 is moved horizontally, and moved upward or downward to cover all stocker stages. A wafer cassette fed from a stocker 1 between steps is transferred to a stocker 2 in a step on the table 3b of the first transfer 3 in a high cleanness zone, and the stocker 2 inputs the cassette. The stocker 2 removes a suitable cassette in a shelf by a request from a manufacturing device, and moves it onto a table 15. The second transfer apparatus 4 transfers the cassette to the device. Since a wafer cassette placing unit of the transfer apparatus can be disposed by utilizing a narrow space, it can be transferred only in the high cleanness zone of the transfer apparatus. |
