| 摘要 |
<p>PURPOSE:To easily obtain an X-ray mask which is high in back etching and pattern position accuracy by forming an X-ray transmitting supporting film layer and X-ray absorbing thin film on a substrate and anodically joining the rear surface of the substrate to a reinforcing frame, and then, coating the exposed part of the rear surface with an alkali-proof protective film. CONSTITUTION:The rear surface of a substrate 4 for blanking, on the front surface of which an X-ray transmitting supporting film 2 and X-ray absorbing thin film 3 are formed, is anodically joined to a reinforcing frame 5. Then an adhesive film 6 having low chemical reactivity is stuck to the part of the rear surface of the substrate 4 which becomes an opening for back etching. After sticking the film 6, the rear surfaces of the substrate 4 and frame 5 are coated with an alkali-proof protective film 7 for back etching and the substrate 4 is patterned after removing the film 6. Then the substrate 4 is back-etched from the rear surface by using the film 7 as a mask. Therefore, an X-ray mask which is excellent in pattern position accuracy can be obtained.</p> |
