发明名称 GRADATION MASK AND ITS MANUFACTURE
摘要 PURPOSE:To provide a gradation mask with stepwise change of the transmittance which can be manufactured in a correct, efficient and inexpensive manner. CONSTITUTION:A gradation mask where the transmittance is changed stepwise in the space over three steps which substantially includes 0% to 100% is manufactured by a manufacturing method including the process where the chromium compound 12 is provided on a transparent substrate 11 to make a film of uniform thickness with transmittance of 0%, the process where the film 12 of chromium compound in the specified region (c) is removed by etching, and the process where etching of the rest of the chromium compound is achieved so that the film thickness in specified region (b) may be the film thickness of the specified intermediate transmittance.
申请公布号 JPH0749410(A) 申请公布日期 1995.02.21
申请号 JP19930195962 申请日期 1993.08.06
申请人 DAINIPPON PRINTING CO LTD 发明人 NAKAMURA HIROYUKI;HAYASHI NAOYA
分类号 G02B5/20;G03F1/68;G03F1/76;G03F1/80 主分类号 G02B5/20
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