| 摘要 |
PURPOSE: To remarkably reduce the oblique residue of resinous solution generated on a cured layer and a base plate by providing a slit of the degree for generating capillarity from the contact part upward at the isolated position of the part in contact with stable liquid surface at a squeegee. CONSTITUTION: A slight oblique (e) to a stable liquid surface 6 is generated at a squeegee 1 in an initial state, a rise is generated at the liquid surface by the control of a viscous rule on a base plate 8 and the cured layer 7a formed on the plate 8. In this case, balances 4, 5 are so regulated that liquid levels l2 , l3 coincide by the capillarity in a slit 2 to precisely parallelize the squeegee 1 with a stable liquid surface 6. Accordingly, the slits 2 are provided at two or more isolated positions of the squeegee 1, and hence the liquid levels in the slits can be amplified even by the slight oblique, the levels are brought into coincidence so that the squeegee 1 and the surface 6 are precisely parallelized, and hence the scraping residue 12 on the layer 7a can be eliminated. |
