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发明名称
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION OF RELIEF PATTERN, AND ELECTRONIC PARTS
摘要
申请公布号
KR20000076587(A)
申请公布日期
2000.12.26
申请号
KR1020000005035
申请日期
2000.02.02
申请人
发明人
分类号
主分类号
代理机构
代理人
主权项
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