发明名称 Thick crack-free silica film by colloidal silica incorporation
摘要 The invention relates to low temperature curable spin-on glass materials which are useful for electronic applications, such as optical devices, in particular for flat panel displays. A substantially crack-free silicon polymer film is produced by (a) preparing a composition comprising at least one silicon containing pre-polymer, colloidal silica, an optional catalyst, and optional water; (b) coating a substrate with the composition to form a film on the substrate, (c) crosslinking the composition by heating to produce a substantially crack-free silicon polymer film, having a thickness of from about 700 Å to about 20,000 Å, and a transparency to light in the range of about 400 nm to about 800 nm of about 90% or more.
申请公布号 US2007099005(A1) 申请公布日期 2007.05.03
申请号 US20050262588 申请日期 2005.10.31
申请人 HONEYWELL INTERNATIONAL INC. 发明人 LEUNG ROGER Y.;NEDBAL JAN;CHEN JINGHONG;GEBREBRHAN AMANUEL H.;MUNOZ BETH C.
分类号 B32B9/04;C08G77/08 主分类号 B32B9/04
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