| 摘要 |
PURPOSE:To facilitate forming a color filter and improve optical and electric characteristics, by providing a black filter on the semiconductor substrate surface. CONSTITUTION:Insulating protection film 107 is formed on semiconductor substrate 101 having photodetecting region 102. Next, black filter 108 is formed on insulating protection film 107. Next, color mixing preventing protection film 112 is formed on black filter 108 and insulating protection film 107, and a prescribed color filter is formed on this color mixing preventing protection film 112. |
