发明名称 Insulated gate field-effect transistor
摘要 An insulated gate field-effect transistor is formed with an intermediate floating gate disposed between the gate electrode and the channel region, said floating gate including a control part extending laterally from between the gate electrode and channel region. Said intermediate floating gate including said control part are embedded in partial layers of dielectric material, said dielectric material electrically isolating said control part from at least one auxiliary electrode to which a voltage may be fed with respect to the substrate for capacitive coupling to the control part whereby the threshold voltage of the insulated gate field-effect transistor may be adjusted within a limited range.
申请公布号 US4251829(A) 申请公布日期 1981.02.17
申请号 US19790080871 申请日期 1979.10.01
申请人 ITT INDUSTRIES, INC. 发明人 ADAM, FRITZ G.
分类号 H01L27/112;H01L21/8246;H01L21/8247;H01L29/49;H01L29/788;H01L29/792;(IPC1-7):H01L29/78 主分类号 H01L27/112
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