| 摘要 |
PURPOSE:To prevent contamination of the light introducing window by providing a discharge electrode in a vacuum vessel to cause the fine particles of a thin film material having reached the vicinity of the light introducing window to be ionized and to be trapped by electric field. CONSTITUTION:In an apparatus for forming thin films, after evacuation of the gas in a vacuum vessel, the target 12 on a thin film material is irradiated and vaporized using a light beam 10 thereby to form a thin film on substrates 13. At this time, a potential is being applied to a discharge electrode 3 in the vicinity of a light introducing window 1 so as to ionize the nearing vaporized fine particles of the thin film material. In addition, by making the potential of the electrode 3 positive, the ions nearing the window 1 are repelled and trapped by the portion charged to a negative potential, whereby contamination of the window 1 by the vaporized material can substantially be reduced. By this, the continuous operating hours of the apparatus or the operating efficiency of the apparatus can be improved. |
