| 发明名称 |
Electron-beam positive polyimide |
| 摘要 |
An insoluble electron beam positive polyimide having the formula <IMAGE> can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.
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| 申请公布号 |
US4886734(A) |
申请公布日期 |
1989.12.12 |
| 申请号 |
US19880240392 |
申请日期 |
1988.09.26 |
| 申请人 |
RENSSELAER POLYTECHNIC INSTITUTE;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MOORE, JAMES A.;DASHEFF, ANDREW N.;KAUFMAN, FRANK B. |
| 分类号 |
C08G73/10;G03F7/039;H01B3/30 |
主分类号 |
C08G73/10 |
| 代理机构 |
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