| 摘要 |
<p>PURPOSE:To make it possible to use both the continuous moving method and the step-and-repeat moving method with one photolithographic system by installing a stage moving means to move a stage in a continuous moving mode or a step-and-repeat moving mode. CONSTITUTION:The title mechanism includes a stage 20 to mount a material 21 to be exposed, a stage moving means 30 to move the stage 20 in a continuous moving mode or a step-and-repeat moving mode, and a means 26 to measure the position of the stage 20. Means 24, 27, and 28 to convert the measured stage position signal into a speed signal and control the stage moving means 30 so that the speed signal may agree with the desired speed signal when the stage 20 is moved in a continuous moving mode are installed. When the stage 20 is moved in a step-and-repeat moving mode, the means 24, 27, and 28 control the stage moving means 30 so that the measured stage position signal may agree with the desired position signal. Thereby the photolithographic system can be used by the continuous moving method and the step-and-repeat moving method.</p> |
