| 摘要 |
PURPOSE:To improve sensitivity and resolution by using a specified radiation sensitive polymer. CONSTITUTION:The radiation sensitive polymer expressed by formula I is used and a radiation sensitive polymer soln. essentially consisting of the radiation sensitive polymer is applied on a substrate to form a thin film and thereafter, the film is irradiated with radiation and the reactive parts are selectively developed by a wet developing method or dry developing method, by which patterns are formed. In the formula I, R<1> denotes a condensed arom. ring consisting of 2 to 5 pieces of benzene rings which may be substd. with at least one kind among a cyano group, alkyl group, alkoxy group, halogen atom, halogenated alkyl group, and sulfonic acid group; R<2> denotes 1 to 10C alkylene group; X denotes at least one kind among a sulfonate group, oxygen atom, carboxyester group, and sulfone amide group; (n) denotes >=10 integer. The patterning with the high sensitivity and high resolution and at a high aspect ratio is executed in this way. |
