发明名称 Apparatus and method for measuring the thickness of a semiconductor wafer
摘要 Apparatus for measuring thicknesses of semiconductor wafers, comprising: housing means for supporting a wafer in a light-tight environment; a light source mounted to the housing at one side of the wafer to emit light of a predetermined wavelength to normally impinge the wafer; a light detector supported at a predetermined distance from a side of the wafer opposite the side on which a light source impinges and adapted to receive light transmitted through the wafer; and means for measuring the transmitted light.
申请公布号 US5396332(A) 申请公布日期 1995.03.07
申请号 US19930014642 申请日期 1993.02.08
申请人 CISZEK, THEODOER F. 发明人 CISZEK, THEODOER F.
分类号 G01B11/06;(IPC1-7):G01B11/06 主分类号 G01B11/06
代理机构 代理人
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