发明名称 Method and appts. for controlling plasma-aided vacuum coating processes
摘要 In the known methods for controlling vacuum coating processes, measurable variables such as plasma emission and coating rate are measured in the plasma or vapor in order to control the vacuum coating process using process parameters of the vaporization or sputtering. This subjects the sensors to high levels of stress, which adversely affects their durability. Using the force of the electrical discharge as a measurable variable, the plasma enhanced vacuum coating process is controlled by measuring the force of the electrical discharge on the coating source. The coating source is arranged in the vacuum chamber with the aid of force transducers (3), and the signal emanating from the force transducers can be used to control, for example, the electrical energy to heat the vaporizing material, the beam deflection or the distribution of the electrical discharge to several coating sources, without the sensors coming in contact with the plasma or the vapor. Plasma enhanced vacuum coating processes, particularly for coating tools and sheet substrates with functional coatings, can be controlled with this method and device.
申请公布号 DE19605316(C1) 申请公布日期 1996.12.12
申请号 DE19961005316 申请日期 1996.02.14
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80636 MUENCHEN, DE 发明人 SCHEFFEL, BERT, 01324 DRESDEN, DE;GOEDICKE, KLAUS, 01307 DRESDEN, DE;METZNER, CHRISTOPH, 01324 DRESDEN, DE;KIRCHHOFF, VOLKER, 01324 DRESDEN, DE
分类号 C23C14/54;H01J37/304;H01J37/32;(IPC1-7):C23C14/54;H01J37/302 主分类号 C23C14/54
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