POLISHING PAD, POLISHING DEVICE AND METHOD TO MANUFACTURE POLISHED BODY HAVING FLAT SURFACE

摘要

PROBLEM TO BE SOLVED: To provide a polishing pad capable of stably maintain a polishing rate high without requiring dressing and a polishing device furnished with this polishing pad. SOLUTION: A polishing pad 40 constituted to have open cells by bonding hard material powder by a base material has a passing groove 30 of slurry for polishing in the thickness direction. It is favourable to make the base material of a soft resin 10 and the hard material powder of hard resin powder. Additionally, it is favourable to make hardness within a range of more than 60 degrees and less than 90 degrees (JIS-K6301) and hardness of the hard resin powder more than 95 degrees (JIS-K6301). Additionally, a polishing device is furnished with this polishing pad 40, a surface plate to install the polishing pad 40 and a head to hold a polished body so as to face against the polishing pad 40 and is constituted so that the polishing pad 40 polishes the polished body by using the slurry for polishing.