发明名称 CRUCIBLE FOR PULLING SEMICONDUCTOR SILICON SINGLE CRYSTAL AND METHOD FOR PRODUCING SEMICONDUCTOR SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To suppress the generation of vibration at liquid surface when a large diameter ingot is pulled while using a quartz crucible by a Czochralski method being one method for producing a silicon single crystal. SOLUTION: It is possible to suppress the deformation of the crucible and the generation of vibration at the liquid surface and to pull the large diameter silicon ingot in a good yield by providing a crucible for pulling semiconductor silicon. The crucible has been melted while vacuum exhausting in a vacuum vessel having a rotary mold and heating electrodes and has an inner transparent layer containing OH in an amount of <=5 ppm, in which the inner transparent layer to a depth of at least 1 mm from the surface is made of synthetic quartz.
申请公布号 JP2002154890(A) 申请公布日期 2002.05.28
申请号 JP20000344710 申请日期 2000.11.13
申请人 KUSUWA KUORUTSU:KK;GUMMA PREFECTURE 发明人 WATABE HIROYUKI;SANPEI KEIKO;MASHITA KANJI
分类号 C03B20/00;C30B15/10;C30B29/06;(IPC1-7):C30B15/10 主分类号 C03B20/00
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