发明名称 |
CRUCIBLE FOR PULLING SEMICONDUCTOR SILICON SINGLE CRYSTAL AND METHOD FOR PRODUCING SEMICONDUCTOR SILICON SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To suppress the generation of vibration at liquid surface when a large diameter ingot is pulled while using a quartz crucible by a Czochralski method being one method for producing a silicon single crystal. SOLUTION: It is possible to suppress the deformation of the crucible and the generation of vibration at the liquid surface and to pull the large diameter silicon ingot in a good yield by providing a crucible for pulling semiconductor silicon. The crucible has been melted while vacuum exhausting in a vacuum vessel having a rotary mold and heating electrodes and has an inner transparent layer containing OH in an amount of <=5 ppm, in which the inner transparent layer to a depth of at least 1 mm from the surface is made of synthetic quartz.
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申请公布号 |
JP2002154890(A) |
申请公布日期 |
2002.05.28 |
申请号 |
JP20000344710 |
申请日期 |
2000.11.13 |
申请人 |
KUSUWA KUORUTSU:KK;GUMMA PREFECTURE |
发明人 |
WATABE HIROYUKI;SANPEI KEIKO;MASHITA KANJI |
分类号 |
C03B20/00;C30B15/10;C30B29/06;(IPC1-7):C30B15/10 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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