发明名称 ELEMENT SUBSTRATE AND ITS MANUFACTURING METHOD, AND ELECTROOPTICAL DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To reduce wiring resistance in an element substrate having such nonlinear element as an MIM element, and the manufacturing method of the element substrate, and an electrooptical device using the element substrate. SOLUTION: A first conductor 11, a non-linear electric conductor 12, and a second conductor 13 are successively laminated on a substrate 1, nonlinear elements S1 and S2 having nonlinearity in current/voltage characteristics in the overlapped section are provided between wiring 2 for inputting signals and a pixel electrode 3. In this case, the first conductor 11 or the second conductor 13, and the wiring 2 for inputting signals and the pixel electrode 3 are formed by a high-conductivity metal layer having the same quality of material.</p>
申请公布号 JP2002204011(A) 申请公布日期 2002.07.19
申请号 JP20010305084 申请日期 2001.10.01
申请人 SEIKO EPSON CORP 发明人 IIZAKA HIDETO;SUGIYAMA ATSUSHI;USHIKI TAKEYOSHI
分类号 G02F1/1365;G09F9/30;G09F9/35;H01L21/3205;H01L23/52;H01L49/02;(IPC1-7):H01L49/02;G02F1/136;H01L21/320 主分类号 G02F1/1365
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