| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem where a waveform becomes asymmetric and right and left difference of the asymmetrical waveform is contained as error in an alignment mark position when step-difference of an alignment mark becomes unclear and roughness is generated on the surface of the alignment mark in the conventional case. SOLUTION: In this alignment mark confirming method, inverted waveforms 103, 203 are formed wherein an asymmetrical waveform 102 and an asymmetrical uneven waveform 202 are inverted by 180 deg. to a perpendicular axis, the waveforms 102, 202 before inversion and curved parts at skirts of the waveforms are overlapped and synthesized, and one symmetrical waveform is formed. Points of intersection (b2, b2') between synthesized waveforms 104, 204 and a reference line 4, or middle points c2', c3' of (b3, 3b') are recognized as positions of alignment marks 101, 201. |
