发明名称 Hollow cathode target and methods of making same
摘要 Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.
申请公布号 US2005167015(A1) 申请公布日期 2005.08.04
申请号 US20050091029 申请日期 2005.03.28
申请人 CABOT CORPORATION 发明人 PARD ROBERT B.;MICHALUK CHRISTOPHER A.
分类号 B21B3/00;C22B5/12;C22F1/00;C22F1/08;C22F1/18;C23C14/34;(IPC1-7):C23C14/32 主分类号 B21B3/00
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