发明名称 |
Hollow cathode target and methods of making same |
摘要 |
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.
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申请公布号 |
US2005167015(A1) |
申请公布日期 |
2005.08.04 |
申请号 |
US20050091029 |
申请日期 |
2005.03.28 |
申请人 |
CABOT CORPORATION |
发明人 |
PARD ROBERT B.;MICHALUK CHRISTOPHER A. |
分类号 |
B21B3/00;C22B5/12;C22F1/00;C22F1/08;C22F1/18;C23C14/34;(IPC1-7):C23C14/32 |
主分类号 |
B21B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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