| 摘要 |
An exposure apparatus including a projecting optical system for projecting a pattern of the original onto a substrate, and an original stage being movable while carrying the original thereon. The original stage includes (i) a first holding portion for holding the original and having a first surface to be contacted to one surface of the original, the first holding portion being configured to position the original in a direction perpendicular to the surface, and (ii) a second holding portion for holding the original and having a second surface to be contacted to the surface, the second holding portion being elastically or resiliently deformable. |
