COATING DEVELOPING MACHINE, RESIST PATTERN FORMING DEVICE, COATING DEVELOPING METHOD, RESIST PATTERN FORMING METHOD, AND STORAGE MEDIUM

摘要

A coating developing machine comprises a heating unit for heating a substrate by using a heating plate for heating and controlling the heating independently multiple regions to be heated by heaters, an optical measuring unit for measuring optical properties of each region by applying light to the region corresponding to each region to be heated of the substrate before the substrate is coated with a resist liquid, a storage section storing the correlation between the predetermined optical properties of the base film of the substrate, the heater heating temperature, and the line width of the resist pattern, and a control section for calculating the heater heating temperature for each region to be heated according to the optical properties of the base film of the substrate measured by the optical measuring unit, the target line width of the resist pattern, and the correlation stored in the storage section and controlling the temperature at each region to be heated of the heating plate according to the calculated heating temperature. According to the invention, the line width of the resist pattern in the surface of the substrate and between the substrate can be controlled with high accuracy.