发明名称 ANTIMICROBIAL DEODORANT COMPOSITION AND MANUFACTURING METHOD OF ANTIMICROBIAL DEODORANT
摘要 PROBLEM TO BE SOLVED: To provide an antimicrobial deodorant composition which has a function of preventing, decomposing and removing low-molecular-weight odor that has penetrated a target over many years or odor in a deep part of the target and a function of decomposing and removing odor deposited on a construction material etc. that has been burnt down and prevents odor production by microbial proteolysis, and to provide a manufacturing method thereof. SOLUTION: The antimicrobial deodorant composition includes a silicone resin showing a permeability and a residual efficacy, diodomethyl-P-trisulfone, a quaternary ammonium salt, 2-phenoxyethanol and ethanol and/or isopropyl alcohol as essential antimicrobial deodorant components, wherein the amount of ethanol and/or isopropyl alcohol among the essential antimicrobial deodorant components is≥50 wt.%. The manufacturing method of the antimicrobial deodorant includes diluting the antimicrobial deodorant composition so that the content of the antimicrobial deodorant components reaches 0.01-2 wt.%. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008222696(A) 申请公布日期 2008.09.25
申请号 JP20070099853 申请日期 2007.03.08
申请人 MORUTETSUKU:KK;NPO KANKYO BISEIBUTSU SAIGAI TAISAKU KYOKAI 发明人 YOSHIDA MOTOSHI
分类号 A01N41/10;A01N25/02;A01N25/10;A61L9/01 主分类号 A01N41/10
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