| 摘要 |
<p>PURPOSE:To automatically form a mask pattern by arbitrarily changing the shape of the mask pattern defined in advance while design rules are taken into consideration when a symbol is developed into the mask pattern. CONSTITUTION:The position data of a disposed symbol is read in, and data indicating the kind of a pattern by which the symbol is defined, is read in. After design rule data has been read in, the symbol is then developed into a pattern. In this case, if it is found that the symbols which change the shape and quality of each element to be formed, are duplicated, the mask pattern defined in advance is thereby changed.</p> |
