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发明名称
Magnetron sputter apparatus and method for forming films by using the same apparatus.
摘要
申请公布号
EP0295649(B1)
申请公布日期
1994.12.14
申请号
EP19880109536
申请日期
1988.06.15
申请人
HITACHI, LTD.
发明人
NAKAGAWA, YUKIO;NATSUI, KEN-ICHI;OHSHITA, YOUICHI;SATO, TADASHI;SETOYAMA, EIJI;KAMEI, MITSUHIRO
分类号
C23C14/35;H01J37/34;(IPC1-7):H01J17/34;C23C14/34
主分类号
C23C14/35
代理机构
代理人
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