摘要 |
<p>PROBLEM TO BE SOLVED: To make a transparent conductive film thin and reduce surface irregular failure caused by ITO level difference parts by covering a wiring part on a transparent electrode film with a metal film having specific work function, and removing the film of metal in a luminescent pattern part. SOLUTION: In a luminescent element, a wiring part on a transparent electrode film is covered with a metal film having a work function of 4.8 eV or less. Preferably, the transparent electrode is an oxide conductor containing either one selected from the group comprising indium, tin, and zinc, the film thickness is made 100 nm or less, and the total film thickness of the oxide conductor and the metal film having a work function of 4.8 eV or less is made 500 mn or less. A desirable wiring pattern is formed on the transparent electrode film on a board, the whole surfaces of the wiring part and the pattern part are covered with the metal film having a work function of 4.8 eV or less, the metal film of the wiring part is remained and that of the luminescent pattern part is removed, and at least one layer of organic layers and a cathode layer are stacked.</p> |