| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas circulation treatment device for supplying a treatment gas to a chamber or the like efficiently. SOLUTION: The gas circulation treatment device comprises a treatment section 11 for performing specific treatment by introducing a treatment gas, gas supply piping 23 for supplying the treatment gas to a treatment section, a first exhaust section 15 for evacuating gas from the treatment section, a second exhaust section 16 for evacuating gas from the first exhaust section to the outside, a back pressure adjustment section 17 for adjusting the back pressure of the first exhaust section, gas circulation piping 21 for merging one portion of the treatment gas evacuated from the first exhaust section with the treatment gas that is supplied from the gas supply piping, and gas introduction piping 24 that is connected to a merge section 22 where gas from the gas supply piping and that from the gas circulation piping are merged and introduces the merged gas to the treatment section. The inner diameter of the gas supply piping is larger than that of the gas introduction piping near the merge section.
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