发明名称 A spectroscopic method for measuring trace impurities in a gas with laser radiation
摘要 <p>The present invention provides a spectroscopic method for analysing objects in a gas comprising a main ingredient and the objects, both of which the absorption spectra exist in the same wavelength range, with high precision and sensitivity by using a compact and simple single cell system. In accordance with an aspect of the present invention, there is disclosed a spectroscopic method for analysing objects in a sample gas using a laser beam comprising : i) a step of splitting a laser beam into a first laser beam and a second laser beam; ii) a step of transmitting said first laser beam into a sample cell where a sample gas is introduced, and measuring an intensity of a spectrum of said transmitted first laser beam ; iii) a step, being performed while performing said step ii), of transmitting said second laser beam into a reference cell where a reference gas is introduced, and measuring an intensity of a spectrum of said transmitted second laser beam, wherein said reference gas comprises an ingredient having at least two spectral lines of which wavelengths in an absorption spectrum of said reference gas are already known; and iv) a step of identifying a wavelength of objects to be measured in said sample gas by comparing said spectrum of sample gas with said spectrum of reference gas using said at least two spectral lines of said reference gas as reference wavelengths.</p>
申请公布号 EP1111369(B8) 申请公布日期 2005.07.06
申请号 EP19990310570 申请日期 1999.12.24
申请人 TAIYO NIPPON SANSO CORPORATION 发明人 MATSUMOTO, KOH;DONG, JIE;MASUSAKI, HIROSHI;SUZUKI, KATSUMASA
分类号 G01N21/35;G01N21/3504;G01N21/359;G01N21/39;(IPC1-7):G01N21/35 主分类号 G01N21/35
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