| 摘要 |
<p>A lithographic apparatus and a method for fabricating a device are provided to produce any desired polarized spatial intensity distribution of the beam in its cross-sectional plane by using re-directing optics. An illumination system includes an array(14) of reflective elements(14a to 14e) for defining intensity distribution of a radiation beam in accordance with an illumination mode, and a polarization member(13) positioned in front of the array in a path of the beam. A support structure supports a patterning device for patterning the beam according to a desired pattern. A substrate table is adapted to hold a substrate. A projection system projects the patterned beam onto a target portion of the substrate.</p> |
