| 发明名称 | Deposition apparatus and deposition method | ||
| 摘要 | A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors. Each of the plasma supply units includes: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches. | ||
| 申请公布号 | US9399819(B2) | 申请公布日期 | 2016.07.26 |
| 申请号 | US201313751282 | 申请日期 | 2013.01.28 |
| 申请人 | ASM IP HOLDINGS B.V. | 发明人 | Cho Hyun-Kyu |
| 分类号 | C23C16/52;C23C16/455;H01J37/32 | 主分类号 | C23C16/52 |
| 代理机构 | Lex IP Meister, PLLC | 代理人 | Lex IP Meister, PLLC |
| 主权项 | 1. A deposition apparatus comprising: a plurality of reactors; a plurality of gas supply units connected to the plurality of reactors; and a plurality of plasma supply units connected to the plurality of reactors, wherein each of the plurality of plasma supply units comprises: a plasma power supplier; a plurality of diodes connected to the plasma power supplier; and a reverse voltage driver connected to the plurality of diodes through respectively corresponding switches. | ||
| 地址 | Almere NL | ||