发明名称 Temporary bonding adhesive for a semiconductor wafer and method for manufacturing a semiconductor device using the same
摘要 To provide a temporary bonding adhesive for a semiconductor wafer that reduces damage to a semiconductor wafer, makes it readily detachable, and can shorten the time required for thermal decomposition, and a manufacturing method for a semiconductor device using this.;A temporary bonding adhesive for a semiconductor wafer, being a temporary bonding adhesive used for temporarily bonding a semiconductor wafer onto a supporting substrate in order to process a semiconductor wafer, and for detaching a semiconductor wafer from a supporting substrate by heating after processing, containing a resin composition whereof the 50% weight loss temperature decreases after irradiation by active energy rays.
申请公布号 US9399725(B2) 申请公布日期 2016.07.26
申请号 US201013126999 申请日期 2010.06.15
申请人 SUMITOMO BAKELITE CO., LTD. 发明人 Takeuchi Etsu;Kusunoki Junya;Sugiyama Hiromichi;Kuboyama Toshiharu;Kawata Masakazu
分类号 H01L21/31;H01L21/469;C09J169/00;C09D177/00;C09D179/08;H01L21/683 主分类号 H01L21/31
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. A temporary bonding adhesive for a semiconductor wafer, used for temporarily bonding a semiconductor wafer onto a supporting substrate in order to process a semiconductor wafer, and for detaching a semiconductor wafer from a supporting substrate by heating after processing, said temporary bonding adhesive containing: a resin composition wherein a 50% weight loss temperature decreases after irradiation by active energy rays; and an activator that generates active species when energy is added by irradiation with said active energy rays, wherein the activator is a photo-acid generating agent, and the resin composition comprises at least one resin selected from the group consisting of polypropylene carbonate, polycyclohexylene carbonate, polybutylene carbonate, and polyneopentyl carbonate.
地址 Tokyo JP