| 摘要 |
PURPOSE:To make the thickness of a deposited film uniform and to save the consumption of gaseous starting material by forming the gas outflow parts of a head so that the cross-sectional shape is extended toward the top and placing a gaseous oxygen outflow part at the periphery of the head. CONSTITUTION:A head 10 having alternately arranged gaseous oxygen outflow parts (a) and gaseous starting material outflow parts (b) is fitted to an ordinary pressure CVD device and the cross-sectional shape of the gas outflow parts 11 is extended toward the top. A gaseous oxygen outflow part 14 is formed at the edge of the gas outflow parts 11 so as to enclose the parts 11. The reaction of the gaseous is facilitated, the thickness of a deposited film is made uniform and the quality of the film is improved. Since the gas outflow parts 11 are enclosed with gaseous oxygen, the amt. of the unreacted gas is reduced and the safety of the device is improved. |
